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上海荏原精密机械有限公司

Model F-REX300X 化学机械研磨设备

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Model F-REX系列 本装置是用于无尘室中对半导体晶元表面进行化学机械研磨的CMP设备。设备具备经市场证明了的高度可靠以及优越的过程处理性能,并能对各个客户的各类规格要求进行灵活应对
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Model F-REX系列 本装置是用于无尘室中对半导体晶元表面进行化学机械研磨的CMP设备。设备具备经市场证明了的高度可靠以及优越的过程处理性能,并能对各个客户的各类规格要求进行灵活应对。

Model F-REX is a clean room-compatible CMP system for chemical mechanical polishing of wafer surfaces. Its high reliability and outstanding process performance have been demonstrated in the market, and it offers diverse and flexible configurations to meet every customer’s needs.

特点:

● 干进干出 *
● 有支持大批量生产的多样辅助设备

● 满足SEMI-2/CE要求
● 优越的工艺性能
● 满足多级药液清洗要求
● 研磨加工终点监测监控仪(可选)
● 在线膜厚测定仪(可选)

● 灵活对应各用户的各类规格要求。

Features and Benefits

Dual-module system with no mutual contamination between process chambers. If one module stops, the other module start the operation automatically. This means that there is no need to shut down the entire unit for maintenance or trouble shooting, enabling high productivity. The dual-module system also facilitates multiple process treatment in one unit. Unit configurations that are ideal not only for mass production but also for testing and development are available.


Model F-REX300X 化学机械研磨设备
Model F-REX300X 化学机械研磨设备

Model F-REX300X 化学机械研磨设备

分享到微信

×

请使用浏览器的分享功能
分享到微信

Model F-REX系列 本装置是用于无尘室中对半导体晶元表面进行化学机械研磨的CMP设备。设备具备经市场证明了的高度可靠以及优越的过程处理性能,并能对各个客户的各类规格要求进行灵活应对
021-60581899
产品详情

Model F-REX系列 本装置是用于无尘室中对半导体晶元表面进行化学机械研磨的CMP设备。设备具备经市场证明了的高度可靠以及优越的过程处理性能,并能对各个客户的各类规格要求进行灵活应对。

Model F-REX is a clean room-compatible CMP system for chemical mechanical polishing of wafer surfaces. Its high reliability and outstanding process performance have been demonstrated in the market, and it offers diverse and flexible configurations to meet every customer’s needs.

特点:

● 干进干出 *
● 有支持大批量生产的多样辅助设备

● 满足SEMI-2/CE要求
● 优越的工艺性能
● 满足多级药液清洗要求
● 研磨加工终点监测监控仪(可选)
● 在线膜厚测定仪(可选)

● 灵活对应各用户的各类规格要求。

Features and Benefits

Dual-module system with no mutual contamination between process chambers. If one module stops, the other module start the operation automatically. This means that there is no need to shut down the entire unit for maintenance or trouble shooting, enabling high productivity. The dual-module system also facilitates multiple process treatment in one unit. Unit configurations that are ideal not only for mass production but also for testing and development are available.


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